JPS527364B2 - - Google Patents

Info

Publication number
JPS527364B2
JPS527364B2 JP48082850A JP8285073A JPS527364B2 JP S527364 B2 JPS527364 B2 JP S527364B2 JP 48082850 A JP48082850 A JP 48082850A JP 8285073 A JP8285073 A JP 8285073A JP S527364 B2 JPS527364 B2 JP S527364B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP48082850A
Other languages
Japanese (ja)
Other versions
JPS5030604A (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP48082850A priority Critical patent/JPS527364B2/ja
Priority to GB3083574A priority patent/GB1460978A/en
Priority to DE2434912A priority patent/DE2434912C2/de
Priority to CA205,472A priority patent/CA1041346A/en
Priority to FR7425584A priority patent/FR2238952B1/fr
Publication of JPS5030604A publication Critical patent/JPS5030604A/ja
Priority to US05/723,061 priority patent/US4275138A/en
Publication of JPS527364B2 publication Critical patent/JPS527364B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP48082850A 1973-07-23 1973-07-23 Expired JPS527364B2 (en])

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP48082850A JPS527364B2 (en]) 1973-07-23 1973-07-23
GB3083574A GB1460978A (en) 1973-07-23 1974-07-11 Photosensitive composition
DE2434912A DE2434912C2 (de) 1973-07-23 1974-07-19 Lichtempfindliches Gemisch
CA205,472A CA1041346A (en) 1973-07-23 1974-07-23 Photosensitive composition
FR7425584A FR2238952B1 (en]) 1973-07-23 1974-07-23
US05/723,061 US4275138A (en) 1973-07-23 1976-09-14 Photosensitive diazonium compound containing composition and article with β-hydroxyalkyl acrylate or methacrylate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48082850A JPS527364B2 (en]) 1973-07-23 1973-07-23

Publications (2)

Publication Number Publication Date
JPS5030604A JPS5030604A (en]) 1975-03-26
JPS527364B2 true JPS527364B2 (en]) 1977-03-02

Family

ID=13785839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48082850A Expired JPS527364B2 (en]) 1973-07-23 1973-07-23

Country Status (6)

Country Link
US (1) US4275138A (en])
JP (1) JPS527364B2 (en])
CA (1) CA1041346A (en])
DE (1) DE2434912C2 (en])
FR (1) FR2238952B1 (en])
GB (1) GB1460978A (en])

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS533216A (en) * 1976-06-28 1978-01-12 Fuji Photo Film Co Ltd Diazo photosensitive composition
JPS5498613A (en) * 1978-01-09 1979-08-03 Konishiroku Photo Ind Co Ltd Photosensitive composition
DE2933827A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung.
EP0051080A1 (en) * 1980-11-03 1982-05-12 Howard A. Fromson Aluminum lithographic plate with visible image and process
JPS5964396A (ja) * 1982-10-05 1984-04-12 Fuji Photo Film Co Ltd 平版印刷版用版面保護剤
US4511640A (en) * 1983-08-25 1985-04-16 American Hoechst Corporation Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer
JPS60186837A (ja) * 1984-03-07 1985-09-24 Somar Corp 感光性組成物
US4539285A (en) * 1984-03-14 1985-09-03 American Hoechst Corporation Photosensitive negative diazo composition with two acrylic polymers for photolithography
DE3504658A1 (de) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial
JPS63170646A (ja) * 1987-01-08 1988-07-14 Konica Corp 現像性等が改良される感光性平版印刷版から印刷版の作製方法
JPH07117747B2 (ja) * 1987-04-21 1995-12-18 富士写真フイルム株式会社 感光性組成物
US4914000A (en) * 1988-02-03 1990-04-03 Hoechst Celanese Corporation Three dimensional reproduction material diazonium condensates and use in light sensitive
JP2668540B2 (ja) * 1988-03-03 1997-10-27 富士写真フイルム株式会社 感光性組成物
JPH01307745A (ja) * 1988-06-07 1989-12-12 Fuji Photo Film Co Ltd 感光性記録材料
DE4002397A1 (de) * 1990-01-27 1991-08-01 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
US5086143A (en) * 1990-07-25 1992-02-04 Eastman Kodak Company Copolymers containing polyoxyalkylene side chains
CA2073147A1 (en) * 1991-07-04 1993-01-05 Mitsubishi Chemical Corporation Photosensitive composition
US5698361A (en) * 1991-10-07 1997-12-16 Fuji Photo Film Co., Ltd. Photosensitive composition
DE69312182T2 (de) * 1992-08-17 1997-12-11 Konishiroku Photo Ind Lichtempfindliche Zusammensetzung
DE4430680A1 (de) * 1994-08-29 1996-03-07 Hoechst Ag Lichtempfindliches Gemisch
US5731127A (en) * 1995-04-11 1998-03-24 Dainippon Ink And Chemicals, Inc. Photosensitive composition and photosensitive planographic printing plate having a resin with urea bonds in the side chain
US6743880B2 (en) * 2000-03-31 2004-06-01 Avery Denison Corporation Hydrophilic polymers and methods of preparation
US6706836B1 (en) 2000-03-31 2004-03-16 Avery Dennison Corporation Hydrophilic polymers, pressure sensitive adhesives and coatings
US6653427B2 (en) * 2000-03-31 2003-11-25 Avery Dennison Corporation Hydrophilic polymers, pressure sensitive adhesives and coatings
US20090078140A1 (en) 2007-09-26 2009-03-26 Fujifilm Corporation Fountain solution composition for lithographic printing and heat-set offset rotary printing process
US20090081592A1 (en) 2007-09-26 2009-03-26 Fujifilm Corporation Fountain solution composition for lithographic printing and heat-set offset rotary printing process
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP2009234247A (ja) 2008-03-07 2009-10-15 Fujifilm Corp 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法
JP5288268B2 (ja) 2009-03-25 2013-09-11 富士フイルム株式会社 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法
JP5281130B2 (ja) 2011-07-05 2013-09-04 富士フイルム株式会社 平版印刷用湿し水組成物

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA614181A (en) * 1961-02-07 J. Mcgraw William Photopolymerizable compositions, elements and processes
BE392892A (en]) * 1931-12-09
US2937085A (en) * 1954-01-11 1960-05-17 Ditto Inc Composite photosensitive plate, and method of making printing plate therefrom
US2980534A (en) 1956-12-17 1961-04-18 Monsanto Chemicals Photographic compositions and photographic elements
NL254617A (en]) * 1959-08-05
US3418295A (en) * 1965-04-27 1968-12-24 Du Pont Polymers and their preparation
JPS4910841B1 (en]) * 1965-12-18 1974-03-13
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
GB1277029A (en) * 1968-11-26 1972-06-07 Agfa Gevaert Photopolymerisation of ethylenically unsaturated organic compounds
JPS4818563B1 (en]) * 1969-03-07 1973-06-07
US3679419A (en) * 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
US3837860A (en) * 1969-06-16 1974-09-24 L Roos PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
US3660097A (en) * 1969-11-28 1972-05-02 Polychrome Corp Diazo-polyurethane light-sensitive compositions
JPS492286B1 (en]) * 1970-02-19 1974-01-19
DE2053363C3 (de) * 1970-10-30 1980-09-18 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
US3778270A (en) * 1970-11-12 1973-12-11 Du Pont Photosensitive bis-diazonium salt compositions and elements
US3715211A (en) * 1971-02-01 1973-02-06 Horizons Inc Process and product of cold sealing an anodized aluminum article by a photo-polymerization process
IT948621B (it) * 1971-02-19 1973-06-11 Howson Algraphy Ltd Procedimento per produrre lastre da stampa litografica e lastre cosi ottenute
US3841874A (en) * 1971-03-15 1974-10-15 Xidex Corp Method for improving the photographic characteristics of vesicular photographic materials
US3790382A (en) * 1971-04-16 1974-02-05 Minnesota Mining & Mfg Fluorinated polyamide-diazo resin coating composition
US3751257A (en) * 1971-04-16 1973-08-07 Minnesota Mining & Mfg Polyamide-diazo resin composition
US3859099A (en) * 1972-12-22 1975-01-07 Eastman Kodak Co Positive plate incorporating diazoquinone
US4123276A (en) * 1974-02-28 1978-10-31 Fuji Photo Film Co., Ltd. Photosensitive composition

Also Published As

Publication number Publication date
FR2238952B1 (en]) 1978-11-24
CA1041346A (en) 1978-10-31
DE2434912A1 (de) 1975-02-06
JPS5030604A (en]) 1975-03-26
DE2434912C2 (de) 1983-08-11
FR2238952A1 (en]) 1975-02-21
US4275138A (en) 1981-06-23
GB1460978A (en) 1977-01-06

Similar Documents

Publication Publication Date Title
AR201758A1 (en])
AU476761B2 (en])
AU465372B2 (en])
AR201235Q (en])
AR201231Q (en])
AU474593B2 (en])
AU474511B2 (en])
AU474838B2 (en])
AU465453B2 (en])
AU471343B2 (en])
AU465434B2 (en])
AU450229B2 (en])
AU476714B2 (en])
AR201229Q (en])
AR199451A1 (en])
AU472848B2 (en])
AU466283B2 (en])
AU476696B2 (en])
AU477823B2 (en])
AR195311A1 (en])
AU476873B1 (en])
AR193950A1 (en])
AU447540B2 (en])
AR195948A1 (en])
AU477824B2 (en])